E-Beam Deposition System
Electron-beam evaporation is a physical vapor deposition technique which uses the kinetic energy of an electron-beam for evaporation. Electron-beam evaporator in the CASE thin film laboratory is dedicated for SiO2 thin film growth only.
Specifications:
- Amount of samples made for a single E-Beam deposition run: maximum of either one 3” wafer or three 3” x 1” glass slides
- 3kW maximum power output (600mA at 5kV)
- Cooper water-cooled hearth, 4x3x2.5 inches dimensions, with four 2cm3 rotary pockets for holding evaporant or crucible liners
- Adjustable beam sweep control
- Quartz infrared emitter and a temperature controller to preheat the substrate and keep it at the desired temperature during the evaporation
CASE Applications:
- Creating insulating barrier and/or sacrificial layer in the micro-fabrication process of Bio MEMS and IR detectors