Karl Suss MJB 3 Mask Aligner

Specifications:

• configured for 365 – 405 nm exposure wavelength
• utilizes a 350 W Hg lamp
• supports substrates up to 3” in diameter
• develop both positive or negative resist depending on mask patterns

CASE Applications:

• micro-fabrication process of building the integrated circuit layout and bridge patterns for both Bio MEMS and IR detectors