The mass analyzed ion implantation (MAII) system is an advanced technology approach for modifying the surface properties of materials.
Specifications:
- ion energies are variable up to 50 keV
- typical ion doses range from 1014 ~ 1017 ions/cm2
- typical ion species include nitrogen, argon, and oxygen
- equipped to create ion species from solid materials as well
- ability to process a maximum of two 4” wafers, six 3” wafers, or twelve 3” x 1” glass slides during one implant
CASE Applications:
- ion beam modification of metal/polymer bilayers to develop metal/polymer mixes whose electrical, optical, mechanical, and chemical properties are desirably altered